Keyphrases
Plasma-enhanced Chemical Vapor Deposition (PECVD)
100%
Mechanical Properties
100%
Silicon Substrate
100%
Nanomechanical Properties
100%
DLC Film
100%
Silicon Incorporation
100%
Microstructure Properties
100%
XPS Analysis
50%
Substrate Effect
50%
Raman Spectroscopy
50%
Film Thickness
50%
Surface Analysis
50%
Chemical Vapor Deposition Processes
50%
Nanoindentation
50%
Young's Modulus
50%
Raman Bands
50%
Nanomechanical Measurements
50%
Intermolecular Structure
50%
Hydrogen Content
50%
Intensity Ratio
50%
Band Intensity
50%
Doped Films
50%
Indentation Depth
50%
Low Hardness
50%
Material Science
Microstructure
100%
Silicon
100%
Plasma-Enhanced Chemical Vapor Deposition
40%
Polymers
20%
Raman Spectroscopy
20%
Film Thickness
20%
Surface Analysis
20%
Vapor Phase Deposition
20%
Hardness
20%
Nanoindentation
20%
Young's Modulus
20%
Molecular Structure
20%
Indentation
20%