A study of microstructure and nanomechanical properties of silicon incorporated DLC films deposited on silicon substrates

Keyphrases

• Plasma-enhanced Chemical Vapor Deposition (PECVD) 100%
• Mechanical Properties 100%
• Silicon Substrate 100%
• Nanomechanical Properties 100%
• DLC Film 100%
• Silicon Incorporation 100%
• Microstructure Properties 100%
• XPS Analysis 50%
• Substrate Effect 50%
• Raman Spectroscopy 50%
• Film Thickness 50%
• Surface Analysis 50%
• Chemical Vapor Deposition Processes 50%
• Nanoindentation 50%
• Young's Modulus 50%
• Raman Bands 50%
• Nanomechanical Measurements 50%
• Intermolecular Structure 50%
• Hydrogen Content 50%
• Intensity Ratio 50%
• Band Intensity 50%
• Doped Films 50%
• Indentation Depth 50%
• Low Hardness 50%

Material Science

• Microstructure 100%
• Silicon 100%
• Plasma-Enhanced Chemical Vapor Deposition 40%
• Polymers 20%
• Raman Spectroscopy 20%
• Film Thickness 20%
• Surface Analysis 20%
• Vapor Phase Deposition 20%
• Hardness 20%
• Nanoindentation 20%
• Young's Modulus 20%
• Molecular Structure 20%
• Indentation 20%