Keyphrases
Stoichiometry
100%
P Ratio
100%
Calcium Phosphate Film
100%
Sputter Deposition
100%
Film Stoichiometry
100%
Multi-target
100%
Crystallinity
75%
As-deposited
75%
Fourier Transform Infrared Spectroscopy (FT-IR)
50%
Calcium Phosphate
50%
Phosphate Surface
50%
X Ray Diffraction
50%
Processing Conditions
50%
Target Composition
50%
X-ray Photoelectron Spectroscopy
25%
Annealing
25%
Deposited Coatings
25%
RF Magnetron Sputtering
25%
Thermal Annealing
25%
Deposition Method
25%
Surface Properties
25%
Diffraction Ray
25%
Preferred Orientation
25%
Diffraction Analysis
25%
Hydroxyapatite
25%
Thermal Processing
25%
Composition Control
25%
Dicalcium Phosphate
25%
Tricalcium Phosphate
25%
In Situ Processing
25%
Co-sputtering
25%
Engineering
Thin Films
100%
Crystallinity
100%
Sputter Target
100%
Surface
66%
Fourier Transform
66%
Processing Condition
66%
Target Composition
66%
Ray Photoelectron Spectroscopy
33%
Requirement
33%
Enhancement
33%
Processing Parameter
33%
Ray Diffraction
33%
Magnetron
33%
Annealing
33%
Preferred Orientation
33%
In Situ Processing
33%
Thermal Processing
33%
X-Ray Diffraction Analysis
33%
Material Science
Thin Films
100%
Coating
100%
Calcium
100%
Sputter Deposition
100%
Fourier Transform Infrared Spectroscopy
22%
Phosphate Coating
22%
X-Ray Photoelectron Spectroscopy
11%
X-Ray Diffraction
11%
Magnetron Sputtering
11%
Hydroxylapatite
11%
Crystalline Material
11%
Annealing
11%
Amorphous Material
11%
Surface Property
11%
X Ray Diffraction Analysis
11%