Electrical characteristics of nitrogen incorporated hydrogenated amorphous carbon

Keyphrases

• Hydrogenated Amorphous Carbon 100%
• Acetylene 100%
• Electrical Characteristics 100%
• Nitrogen Incorporation 100%
• Atomic Nitrogen 100%
• Nitrogen Incorporated 100%
• Nitrogen Flux 100%
• Plasma-enhanced Chemical Vapor Deposition (PECVD) 50%
• Peak Shift 50%
• X-ray Photoelectron Spectroscopy 50%
• Doping Level 50%
• Electrical Properties 50%
• Field Emission Properties 50%
• RF Plasma 50%
• Contact Potential Difference 50%
• Structural Change 50%
• Dissociation 50%
• G-band 50%
• Density of States 50%
• Doped Films 50%
• Bias Voltage 50%
• Potential Density 50%
• Doping Process 50%
• I-V Technique 50%
• Film Stress 50%
• Nitrogen-rich 50%
• Fermi Level 50%
• Capacitance Probe 50%
• X-10 50%

Material Science

• Electrical Property 100%
• Amorphous Hydrogenated Carbon 100%
• Film 50%
• Density 50%
• Plasma-Enhanced Chemical Vapor Deposition 50%
• X-Ray Photoelectron Spectroscopy 50%
• Doping (Additives) 50%
• Probe 50%
• Capacitance 50%

Chemical Engineering

• Carbon 100%
• Nitrogen 100%
• Plasma Enhanced Chemical Vapor Deposition 16%
• Acetylene 16%