Keyphrases
Hydrogenated Amorphous Carbon
100%
Acetylene
100%
Electrical Characteristics
100%
Nitrogen Incorporation
100%
Atomic Nitrogen
100%
Nitrogen Incorporated
100%
Nitrogen Flux
100%
Plasma-enhanced Chemical Vapor Deposition (PECVD)
50%
Peak Shift
50%
X-ray Photoelectron Spectroscopy
50%
Doping Level
50%
Electrical Properties
50%
Field Emission Properties
50%
RF Plasma
50%
Contact Potential Difference
50%
Structural Change
50%
Dissociation
50%
G-band
50%
Density of States
50%
Doped Films
50%
Bias Voltage
50%
Potential Density
50%
Doping Process
50%
I-V Technique
50%
Film Stress
50%
Nitrogen-rich
50%
Fermi Level
50%
Capacitance Probe
50%
X-10
50%
Material Science
Electrical Property
100%
Amorphous Hydrogenated Carbon
100%
Film
50%
Density
50%
Plasma-Enhanced Chemical Vapor Deposition
50%
X-Ray Photoelectron Spectroscopy
50%
Doping (Additives)
50%
Probe
50%
Capacitance
50%
Chemical Engineering
Carbon
100%
Nitrogen
100%
Plasma Enhanced Chemical Vapor Deposition
16%
Acetylene
16%