In this paper, we present the fabrication of micro/nano fluidic devices with the combination of proton beam writing and UV lithography. Proton beam writing was used to generate the fine features with smooth sidewall profiles on ma-N resist, 110 and 600 nm thick. UV lithography is used to fabricate the micron sized feeding channels properly aligned with the nanostructures on ma-P resist. To get a durable mold, we need to transfer the resist structure into a nickel mold. Nickel electroplating and re-electroplating have been carried out to replicate the polymer structure in a nickel mold with the desired geometry, resulting in a durable Ni master mold. Finally it is demonstrated that these Ni molds can be used to make high quality PDMS fluidic channels used for DNA lab on chip experiments.
Bibliographical noteFunding Information:
We acknowledge the support from A ∗ STAR ( R-144-000-261-305 ).
Copyright 2012 Elsevier B.V., All rights reserved.
- DNA analysis
- Nickel molds
- Proton beam writing