Keyphrases
Self-limiting
100%
Hydrogen Fluoride
100%
Thermal Atomic Layer Etching
100%
Zirconium Dioxide
100%
HfO2
100%
Limiting Temperature
100%
Temperature Window
100%
Atomic Scale
100%
Oxides
25%
Etching Process
25%
Atomic Layer Etching
25%
Metal Oxide
12%
Elevated Temperature
12%
Thermodynamics
12%
Reaction Model
12%
Materials Processing
12%
Downscaling
12%
Atomic Level
12%
Semiconductor Devices
12%
Etching Rate
12%
Oxide Surfaces
12%
Level Control
12%
High Coverage
12%
First-principles Method
12%
Maximum Coverage
12%
Mechanistic Details
12%
Device Sizing
12%
High-k Material
12%
Thermal Barrier
12%
Fluorination
12%
Ligand Exchange Reaction
12%
Fluoride Adsorption
12%
Spontaneous Etching
12%
Nanoscale Devices
12%
Adsorbed Hydrogen
12%
Engineering
Atomic Layer
100%
Exchange Reaction
16%
Material Science
Ligand Exchange Reaction
20%