Substrate effects on the microstructure of hydrogenated amorphous carbon films

Keyphrases

• Substrate Effect 100%
• Microstructure 100%
• Silicon Substrate 100%
• Hydrogenated Amorphous Carbon Film 100%
• Polymer Substrate 50%
• Plasma-enhanced Chemical Vapor Deposition (PECVD) 50%
• Carbon Film 50%
• X-ray Absorption Near Edge Structure (XANES) 50%
• Near-edge X-ray Absorption Fine Structure (NEXAFS) 50%
• Growth Conditions 50%
• Peak Position 50%
• Chemical Bonding 50%
• Hydrogenated 50%
• Electrical Conductivity 50%
• Delamination 50%
• Stainless Steel Substrate 50%
• G Peak 50%
• Low Adhesion 50%
• Delaminating 50%
• Dielectric Breakdown Strength 50%
• High-k Dielectric 50%
• Metallic Substrate 50%
• Silicon Layer 50%
• Carbides 50%

Material Science

• Microstructure 100%
• Silicon 100%
• Carbon Films 100%
• Amorphous Material 100%
• Metal 50%
• Adhesion 25%
• Plasma-Enhanced Chemical Vapor Deposition 25%
• Coating 25%
• Probe 25%
• Mechanical Strength 25%
• Polymeric Substrate 25%
• Chemical Bonding 25%
• Electrical Resistivity 25%
• Delamination 25%
• Stainless Steel 25%
• Electrical Breakdown 25%
• Carbide 25%

Engineering

• Substrates 100%
• Microstructure 100%
• Amorphous Hydrogenated Carbon 100%
• Thickness 80%
• Silicon Substrate 40%
• Ray Absorption 40%
• Chemical Vapor Deposition 20%
• Deposited Film 20%
• Vapor Deposition 20%
• Dielectrics 20%
• Polymeric Substrate 20%
• Growth Condition 20%
• Delamination 20%
• Stainless Steel 20%
• Silicon Layer 20%